Tuesday, July 12, 2011

Chemical Mechanical Polishing (CMP) with Sukbae Joo

This episode features a focus on CMP, chemical mechanical planarization/polishing, and ECMP, electrochemical mechanical planarization/polishing. Sukbae Joo, a PhD candidate at Texas A&M, is conducting research in this field, and provides his perspective on CMP/ECMP and its role within the tribology field. He includes some of the challenges presented by this type of work, but also the successes he's had. To listen, click play in the slider bar above, download the episode, or read/translate the transcript.

This research plays an important role in the semiconductor industry, given that this method is used to create objects like optical lenses, LCD panels, MEMS, field emission displays, and plasma display panels (PDP) for televisions. These consumer applications are constantly changing and being improved upon - which creates a need for better methods and technology to create the products. CMP/ECMP is a path to that goal.

Sukbae also mentions his work on hydrogen embrittlement, which was the subject of his poster for the 2011 STLE Annual Meeting Student Poster Competition. In addition to entering the contest, he was the Vice Chair, helping to organize the competition for all those involved. Next year, he will become the Chair, and we look forward to his further involvement with STLE! You too can get involved. Visit our website for more details and to get started today.

What was your student poster competition experience like? How can it be improved? What would you like changed for next year? Tell us! Post a comment below, or send an email to klemar@stle.org.

No comments:

Post a Comment